Story thread · 2 reports / 2 sources

UBS says China is unlikely to match ASML’s top tool this decade

thenextweb.com · 13dShare

UBS analysts say China’s lithography programme is at roughly the stage ASML reached in 2004 and will not produce a viable EUV alternative within a decade. They also expect China to reach high-volume manufacturing of immersion DUV machines in two to five years, which is the category the Dutch government controls through export licences. China […] This story continues at The Next Web

First report: China Unlikely to Match ASML’s Top Tool in Next Decade, UBS Says — bloomberg.com, 13d